Release agent

5919290
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Inventors

Ishikawa, Hiroki
Naganawa, Tsutomu
Ona, Isao

Application #

124143

Filed

Jul-29-1998

Published

Jul-6-1999

Current US Class

106/2
106/287.14
106/38.22

International Classes

C09K 003/18

Field of Search

106/2 106/38.22 106/287.14

Assignee

Dow Corning Toray Silicone Co., Ltd. (Tokyo, JP)

Examiners

Green; Anthony

Attorney, Agent or Firm

Milco; Larry A.

US Patent References

4889677   Process for curing t...
5130460   Siloxane compoun...
5138012   Silicone release co...
5449712   Organosilicon emu...
5531814   Self-leveling silicon...
5599778   Organosiloxane lu...
5604039   Thermally stable re...

Referenced by:

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Citation

Cite This Patent

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Abstract
A release agent comprising a mixture of (A) a dimethylpolysiloxane and (B) an organopolysiloxane with phenolic hydroxyl groups, said mixture having an average phenol equivalent within the range of 10,000 to 5,000,000 and a dimethylsiloxane oligomer with less than 20 silicon atoms in an amount of less than 5,000 ppm, said agent having a viscosity within the range of 5.times.10.sup.-5 to 1.times.10.sup.-1 m.sup.2 /s at 25.degree. C. The release agent of the present invention possesses excellent heat-resistant and release properties, and suppresses formation of formaldehyde under the effect of thermal decomposition.
 
Claims
That which is claimed is:

1. A release agent composition, comprising:

(A) a material comprising a dimethylpolysiloxane and

(B) a material comprising an organopolysiloxane having phenolic groups,

wherein the composition has an average phenol equivalent of from 10,000 to 5,000,000, contains less than 5,000 ppm of a dimethylsiloxane oligomer having less than 20 silicon atoms, and has a viscosity of from 5.times.10.sup.-5 to 1.times.10.sup.-1 m.sup.2 /s at 25.degree. C.

2. The composition according to claim 1, wherein component (A) has a linear molecular structure.

3. The composition according to claim 1, wherein component (A) has a partially branched linear molecular structure.



Description
FIELD OF THE INVENTION

The present invention relates to a release agent, more particularly, to a release agent of the type that possesses excellent resistance to heat, excellent release properties, and the ability of suppressing formation of formaldehyde under the effect of thermal decomposition.

BACKGROUND OF THE INVENTION

As organopolysiloxane oils possess good heat-resistant and release properties, they find wide application in toner release agents for Xerography, as well as in mold-release agents used in molding thermoplastic, thermosetting resins, or various rubbers. However, when dimethylpolysiloxane oils, which are typical representatives of organopolysiloxane oils, are used in mold-release agents, they are often subject to thermal decomposition because the temperature on the walls of the mold often exceeds 150.degree. C. When this temperature exceeds 200.degree. C., the thermal decomposition process is vigorously intensified, and this causes problems associated either with the formation of a viscous gel-like composition, or with the formation of a formaldehyde that possesses harmful properties. Furthermore, in high-speed Xerography (hereinafter referred to as "electrophotography") heat rollers operate under high-temperature conditions of about 200.degree. C. Therefore, when dimethylpolysiloxane oils are used as toner-release agents, they are subject to thermal decomposition which is accompanied by the formation of formaldehyde. The recent demand for an increase in mold production and for a decrease in fixation, led to an increase in the temperature of molds and heat rollers of electrophotographic equipement. In response to this demand, the authors have developed a release agent (see Japanese Laid-Open Patent Application (Kokai) 7-216376) with improved heat-resistant properties, this agent comprising a diorganopolysiloxane which contains phenol groups.
 
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