Film peeling method and apparatus

4880488
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Inventors

Matsuo, Takao
Hamamura, Fumio
Sumi, Shigeo

Application #

258045

Filed

Oct-14-1988

Published

Nov-14-1989

Current US Class

156/344
156/584

International Classes

B32B 031/18

Field of Search

156/344 156/584

Assignee

Somar Corporation (Tokyo, JP)

Examiners

Dawson; Robert A.

Attorney, Agent or Firm

Sughrue, Mion, Zinn, Macpeak & Seas

US Patent References

3951727   Delaminating meth...
4631103   Process for peeling...
4631110   Peeling type develo...
4770737   Film peeling appar...
4798646   Film peeling appar...

Referenced by:

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Citation

Cite This Patent

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Abstract
An apparatus for peeling a film from a substrate is disclosed which comprises: film peeling guide members for setting a direction of peeling of the film; peeling members for peeling off a part of the film and sticking the part onto the film peeling guide members; a film conveying subsystem for supporting the film stuck onto the film peeling guide members and removing the film out of the apparatus; and guide member moving mechanism for causing the film peeling guide members to change their angular positions. Also, a related method is disclosed herein.
 
Claims
We claim:

1. A film peeling apparatus for peeling a film substrate;

a film raising means for raising a film from a substrate;

a film peeling guide member arranged substantially perpendicular to said substrate, to set the direction of peeling of said film thus raised to predetermined angle; and

film peeling and conveying means for peeling and conveying said film thus raised by said film raising means, wherein at the beginning of peeling said film, said substrate is conveyed at a speed greater than the speed at which said film is conveyed.

2. a film peeling apparatus for peeling a film from a substrate, comprising:

film raising means for raising a film from a substrate;



Description
BACKGROUND OF THE INVENTION

This invention relates to a film peeling technique, and more particularly to a technique which can be effectively employed to peel a protective film from a substrate.

In a printed circuit board used in an electronic device such as a computer, a predetermined circuit is formed with copper on one or both sides of an insulated substrate. A printed circuit board of this type can be manufactured as follows: First, a laminate consisting of a photosensitive resin (photo-resist) layer and a translucent resin film (protective film) for protecting the photosensitive resin layer is thermally formed on the conductive layer of the insulated substrate under pressure. Thereafter, a circuit pattern film is laid over the laminate, and the photosensitive resin layer is exposed to light through the circuit pattern film and the translucent resin film for a predetermined period of time. After peeling the translucent resin film, the photosensitive resin layer thus exposed to light is subjected to developing to form an etching mask pattern. Then, the unnecessary parts of the conductive layer are removed by etching, and the remaining photosensitive resin is peeled off, to obtain a printed circuit board having the predetermined circuit pattern.
 
  A film peeling apparatus for peeling a film from a substrate comprises film raising means for raising a part of the film from the substrate, and fluid...  A film peeling method for peeling a film bonded to a board, one end portion of the film overhanging from one end of the board, comprises the steps of:...