Particle beam device

6498345
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Inventors

Weimer, Eugen
Drexel, Volker

Application #

339348

Filed

Jun-23-1999

Published

Dec-24-2002

Current US Class

250/306
250/307
250/310
250/397

International Classes

H01J 037/244; H01J 037/256

Field of Search

250/492.2 250/310 250/306 250/305 250/397

Assignee

LEO Elektronenmikroskopie GmbH (DE)

Examiners

Lee; John R.

US Patent References

4528452   Alignment and det...
4831266   Detector objective fo...
4896036   Detector objective fo...
4926054   Objective lens for fo...
5063293   Positron microscopy
5466940   Electron detector wi...
5644132   System for high res...
5894124   Scanning electron...
5945672   Gaseous backscatte...
6084238   Scanning electron...
6201240   SEM image enhan...

Referenced by:

View Backward References

Other References

Nuclear Instruments and Methods in Physics Research A 363 (1995) 31-42, Low-Voltage Probe forming columns for electrons. S. Beck, E. Plies and B. Scheibel. U.S. patent applications Ser. No. 09/123,017, Weimer et al., filed Jul. 27, 1998. Khursheed A: "High Speed Electron-Beam Testing of VLSI Circuits by Backscattered Electron Detection", Electronics Letters, Bd. 26, Nr. 20, Sep. 27, 1990, Seiten 1657-1658, XP000109541, ISSN: 0013-5194. European Search Report dated Jun. 1, 2001 (2 pages) for EP 99 10 9886.

Citation

Cite This Patent

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Abstract
In an electron beam device such as a raster electron microscope, two annular detectors are arranged at a distinct distance along the optical axis between a beam producer and an objective. The distance between the two detectors amounts to at least 25% of the distance between the specimen-side detector and the specimen. The source-side detector serves for detection of back-scattered or secondary electrons which are transmitted through the bore provided through the specimen-side detector for the passage of the primary particle beam. The source-side detector is a conversion diaphragm with an Everhart Thornley detector arranged laterally thereof. The conversion diaphragm produces secondary electrons on impingement of charged particles. By application of two detectors offset in the direction of the optical axis, the yield of the secondary electrons used for image production is increased. The secondary electrons are separated according to their angle of emergence from the specimen.
 
Claims
We claim:

1. A particle beam device having an optical axis, and comprising:

a beam producer,

an objective having a focal plane that focuses a particle beam onto a specimen,

an electrostatic braking device by which an energy of said particle beams impinging on said specimen is varied from a primary energy above 5 keV down to a lowest primary energy below 200 eV,

two detectors arranged between said beam producer and said focal plane of said objective for particles back-scattered or emitted from said specimen,

wherein said two detectors are arranged offset from each other in the direction of the optical axis, and the distance between said two detectors is between 50% and 75% of the distance between a specimen-side detector of said two detectors and said focal plane of said objective.



Description
CROSS-REFERENCES TO RELATED APPLICATIONS

Not applicable.

STATEMENT REGARDING FEDERALLY SPONSORED RESEARCH OR DEVELOPMENT

Not applicable.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to particle beam devices with ions or electrons, and more particularly to such devices that are used for imaging, analyzing, and processing of specimen surfaces.

For image production a focused particle beam is guided in a raster over the specimen surface and the signals which result from interaction with the primary particles are sensed and associated with their respective place of origin. Besides a high spatial resolution which is attained by a small diameter of the particle beam in the plane of the specimen, as high as possible an efficiency of the detection of the different signals is required.

2. Discussion of Relevant Art

The resolution of particle beam devices is in principle at its best when the specimen is situated very close to the objective lens or even inside this lens. This has as a consequence that the detection system for the detection of secondary particles and/or back-scattered particles must be arranged inside the objective lens or in a region which is free from fields and is between the objective lens and the particle source. The best resolution, particularly at low particle energies, is attained with arrangements in which the particles in the beam production system are first accelerated to a high energy and are braked to the desired energy at the end of the particle optical arrangement in an objective lens or in the region between the objective lens and the specimen.
 
  A monochrometer mounted with the electron gun of an electron microscope or the like. This monochrometer does not need movement of a slit. An electron source...  A scanning electron microscope which obtains a two-dimensional scan image of a sample includes an electron source and a scan deflector for scanning a primary...