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Inventors
Kurita, Shinichi
Blonigan, Wendell T.
Hosokawa, Akihiro
Application #
464362
Filed
Dec-15-1999
Published
Sep-27-2005
Current US Class
118/719
118/724
414/217
International Classes
C23C 016/00
Field of Search
414/217 118/719 118/724
Assignee
Applied Materials, Inc. (Santa Clara, CA)
Examiners
Mills; Gregory
Attorney, Agent or Firm
Moser, Patterson & Sheridan LLP
US Patent References
| 3976330 |
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Transport system fo... |
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| 4047624 |
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Workpiece handlin... |
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| 4178113 |
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Buffer storage app... |
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| 4311542 |
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Method for manufa... |
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| 4512391 |
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Apparatus for ther... |
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| 4680061 |
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Method of thermal t... |
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| 4687542 |
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Vacuum processin... |
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| 4693777 |
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Apparatus for prod... |
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| 4709655 |
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Chemical vapor de... |
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| 4759681 |
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End station for an i... |
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| 4770590 |
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Method and appar... |
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| 4775281 |
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Apparatus and met... |
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| 4785962 |
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Vacuum chamber... |
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| 4801241 |
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Modular article pro... |
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| 4828224 |
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Chemical vapor de... |
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| 4836733 |
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Wafer transfer system |
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| 4846102 |
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Reaction chambers... |
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| 4857689 |
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Rapid thermal fur... |
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| 4863547 |
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Equipment for heat... |
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| 4870923 |
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Apparatus for treati... |
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| 4895107 |
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Photo chemical rea... |
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| 4911103 |
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Processing apparat... |
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| 4913929 |
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Thermal/microwav... |
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| 4923584 |
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Sealing apparatus... |
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| 4951601 |
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Multi-chamber inte... |
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| 4952299 |
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Wafer handling ap... |
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| 4966519 |
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Integrated circuit pr... |
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| 4989543 |
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Process and means... |
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| 4990047 |
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Vacuum apparatus |
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| 5001327 |
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Apparatus and met... |
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| 5044871 |
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Integrated circuit pr... |
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| 5060354 |
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Heated plate rapid... |
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| 5131460 |
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Reducing particul... |
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| 5186718 |
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Staged-vacuum wa... |
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| 5187115 |
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Method of forming... |
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| 5199483 |
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Method and appar... |
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| 5202716 |
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Resist process system |
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| 5227708 |
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Two-axis magnetic... |
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| 5252807 |
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Heated plate rapid... |
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| 5254170 |
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Enhanced vertical t... |
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| 5259881 |
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Wafer processing c... |
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| 5259883 |
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Method of thermall... |
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| 5261935 |
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Clean air apparatus |
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| 5288379 |
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Multi-chamber inte... |
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| 5292393 |
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Multichamber inte... |
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| 5352294 |
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Alignment of a sha... |
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| 5355066 |
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Two-axis magnetic... |
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| 5376212 |
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Reduced-pressure... |
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| 5404894 |
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Conveyor apparatus |
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| 5414244 |
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Semiconductor waf... |
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Method and appar... |
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| 5443346 |
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Wafer conveying sy... |
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| 5445484 |
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Vacuum processin... |
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| 5447409 |
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Robot assembly |
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| 5464313 |
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Heat treating appar... |
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| 5469035 |
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Two-axis magnetic... |
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| 5470784 |
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Method of forming... |
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| 5474410 |
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Multi-chamber syst... |
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| 5512320 |
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Vacuum processin... |
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| 5516732 |
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Wafer processing... |
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| 5536128 |
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Method and appar... |
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| 5570994 |
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Wafer tray and cer... |
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| 5586585 |
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Direct loadlock inte... |
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| 5588827 |
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Passive gas substra... |
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| 5607009 |
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Method of heating... |
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| 5609689 |
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Vacuum process a... |
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| 5611655 |
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Vacuum process a... |
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| 5611865 |
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Alignment of a sha... |
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| 5615988 |
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Wafer transfer syste... |
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| 5616208 |
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Vacuum processin... |
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| 5636964 |
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Wafer tray and cer... |
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| 5655277 |
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Vacuum apparatus... |
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| 5674786 |
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Method of heating... |
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| 5685684 |
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Vacuum processin... |
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| 5695568 |
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Chemical vapor de... |
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| 5697749 |
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Wafer processing a... |
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| 5700127 |
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Substrate processin... |
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| 5716207 |
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Heating furnace |
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| 5738767 |
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Substrate handling... |
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| 5784799 |
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Vacuum processin... |
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| 5795355 |
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Integrated micro-en... |
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| 5820679 |
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Fabrication system... |
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| 5833426 |
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Magnetically coupl... |
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| 5855681 |
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Ultra high through... |
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| 5855726 |
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Vacuum processin... |
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| 5882165 |
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Multiple chamber i... |
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| 5882413 |
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Substrate processin... |
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| 5884009 |
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Substrate treatment... |
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| 5891251 |
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CVD reactor havin... |
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| 5902088 |
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Single loadlock ch... |
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| 5909994 |
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Vertical dual loadl... |
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| 5913978 |
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Apparatus and met... |
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| 5934856 |
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Multi-chamber trea... |
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| 5942013 |
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Substrate processin... |
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| 5944857 |
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Multiple single-waf... |
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| 5951770 |
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Carousel wafer tra... |
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| 5954472 |
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Batch loader arm |
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| 5997235 |
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Swap out plate and... |
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| 6007675 |
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Wafer transfer syste... |
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| 6016611 |
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Gas flow control in... |
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| 6034000 |
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Multiple loadlock s... |
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| 6039770 |
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Semiconductor dev... |
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Two-wafer loadlock... |
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| 6044534 |
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Semiconductor dev... |
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| 6048154 |
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High vacuum dual... |
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| 6079693 |
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Isolation valves |
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| 6082950 |
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Front end wafer sta... |
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| 6086362 |
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Multi-function cha... |
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| 6120229 |
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Substrate carrier as... |
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| 6143083 |
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Substrate transferri... |
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| 6145673 |
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Wafer transfer cass... |
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Tandem process ch... |
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Substrate transport... |
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| 6162299 |
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Multi-position load... |
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| 6176668 |
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In-situ substrate tra... |
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| 6193507 |
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Multi-function cha... |
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Substrate transfer s... |
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| 6213704 |
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Method and appar... |
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| 6215897 |
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Automated substrat... |
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| 6235634 |
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Modular substrate... |
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| 6270582 |
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Single wafer load l... |
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| 6286230 |
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Method of controlli... |
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Referenced by:
View Backward References
Other References
U.S. Appl. No. 09/451,628, filed Nov. 30, 1999 including application as filed, formal drawings and pending claims. Search Report for Singapore Application No. SG 200007457-5, mailed from Singapore IP Office Jul. 10, 2002. Int'l search report for PCT/US 98/21386 dated Feb. 23, 1999. EP search report for appl. No. 97105221.2 dated May 18, 2001. U.S. Appl. No. 09/082,484 (filed May 20, 1998) including allowed claims. U.S. Appl. No. 09/429,175 (filed on Oct. 28, 1999) including pending claims. U.S. Appl. No. 09/732,159 (filed on Dec. 7, 2000, parent filed May 20, 1998) including allowed claims. Int'l search report PCT/IB99/01140 dated Nov. 11, 1999. EP 9710332.8 Search issued Oct. 6, 1998. Iscoff, Ron, ed. "Dry Etching Systems: Gearing Up for Larger Wafers," Semiconductor International, Oct. 85, pp. 49-60. Declaration of Thomas B. Brezocsky dated Jan. 29, 1999.
Citation
Cite This Patent
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