Substrate transport container

6875282
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Inventors

Tanaka, Akira
Suzuki, Yoko
Kishi, Takashi

Application #

145692

Filed

May-16-2002

Published

Apr-5-2005

Current US Class

118/719
156/345.31
414/935
414/940

International Classes

C23C 016//00

Field of Search

118/719 156/345.31 156/345.32 414/937 414/938 414/940 206/710-712 206/832-833

Assignee

Ebara Corporation (Tokyo, JP)

Examiners

Hassanzadeh; Parviz

Attorney, Agent or Firm

Wenderoth, Lind & Ponack, L.L.P.

US Patent References

4724874   Sealable transporta...
4770680   Wafer carrier for a...
5248033   Hinged tilt box with...
5346518   Vapor drain system
5664679   Transport container...
5709065   Desiccant substrate...
5785186   Substrate housing...
5833726   Storing substrates b...
5843196   Ultra-clean transpo...
5873468   Thin-plate supporti...
6003674   Method and appar...
6221163   Molecular contami...
6364922   Substrate transport...
 

Referenced by:

View Backward References

Other References

Akira Tanaka et al., "Cleanbox", U.S. Appl. No. 09/555,798, filed Dec. 2, 1998. Yoko Suzuki et al., "Substrate Container and Method of Dehumidifying Substrate Container", U.S. Appl. No. 09/769,308, filed Jan. 26, 2001. Akira Tanaka et al., "Power Supply Apparatus for Supplying Electric Power to Substrate Carrier Container", U.S. Appl. No. 09/987,383, filed Nov. 14, 2001. Yoko Suzuki et al., "Substrate Transport Apparatus, Pod and Method", U.S. Appl. No. 10/000,304, filed Dec. 4, 2001.

Citation

Cite This Patent

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Abstract
A substrate transport container is used, for example, in the process of manufacturing integrated circuits of less than 0.13 .mu.m line width, can hold the level of contaminants in the interior of the container for at least particles, acidic gases, basic gases, organic substances and humidity at controlled low levels, and has the size and structure to be compatible with automated semiconductor manufacturing plants. The container is provided with a door for loading and unloading substrates on a surface of a container main body and is constructed so as to hold the substrates inside the container main body at a given distance of separation. Air conditioning apparatuses for reducing the levels of particulate and gaseous contaminants are disposed roughly symmetrically on the container main body.
 
Claims
What is claimed is:

1. A substrate transport container having a door for loading and unloading substrates on a surface of a container main body and constructed so as to hold the substrates inside the container main body at a given distance of separation, wherein air conditioning apparatuses are disposed substantially symmetrically on a lateral surface of the container main body for reducing concentrations of particles and gaseous contaminants in interior of the container, wherein the container main body is provided with a cover for isolating an interior environment of the container main body from an external environment on both lateral surfaces of the container main body, and openings are provided on said lateral surfaces of the main body inside said cover to communicate with an interior space of the container main body so as to circulate air that has been adjusted in the air conditioning apparatus disposed inside the cover through the interior space of the container main body.



Description
BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to the structures, capabilities and methods of operating a substrate transport container suitable for storing or transporting objects such as semiconductor wafers, photo-masks or hard-disks in a highly clean environment.

2. Description of the Related Art

As pattern sizes of semiconductor devices become finer, it is anticipated that even higher degree of cleanliness would be required in the future. For example, it is anticipated that the target control size of the particulate contaminants that can cause pattern defects and shorting of wiring would become smaller than 0.1 .mu.m. Further, in addition to particulate contaminants, it becomes necessary to reduce gaseous contaminants. By adsorbing onto the semiconductor wafers, various hydrocarbon molecules cause deterioration in dielectric breakdown voltage of gate oxide film or thickness variations in deposited films. Base gases react with chemical enhancement type photoresist to result in loss of resolution and acidic gases can cause corrosion of wirings.