Thermal decomposition cell

5222074
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Inventors

Uchiyama, Kiyoshi
Suzuki, Tomoko
Yokotsuka, Tatsuo
Takamori, Akira
Nakajima, Masato

Application #

709280

Filed

Jun-3-1991

Published

Jun-22-1993

Current US Class

118/719
118/730
373/10
373/109
373/11
373/111
427/252
427/255.28

International Classes

H01J 037/305

Field of Search

219/121.19 219/121.2 219/121.33 118/719-730 156/DIG. 373/10 373/11 373/109 373/111 427/252 427/255.1 427/255.3

Assignee

Matsushita Electric Industrial Co., Ltd. (Osaka, JP)

Examiners

Reynolds; Bruce A.

Attorney, Agent or Firm

Pollock, VandeSande & Priddy

US Patent References

4674442   Process and appar...
4699083   Molecular beam g...
4792378   Gas dispersion disk...
4986216   Semiconductor ma...
4990374   Selective area che...

Referenced by:

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Citation

Cite This Patent

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Abstract
A thermal decomposition cell for producing a molecular beam from a material gas, includes: a crucible maintained at a given temperature necessary for thermal decomposition of the material gas which is effused in the crucible in a given direction; and a thermal decomposition baffle provided in the crucible and heated to a given temperature necessary for thermal decomposition of the material gas for producing the molecular beam by thermal-decomposing of the material gas such that the material gas is baffled in substantially all directions, the thermal decomposition baffle being made of a given metal to cause the thermal decomposition of the material gas. The thermal decomposition baffle may comprise a fiber or a cloth made of the metal loaded in the crucible. The thermal decomposition baffle may comprise a plurality of different sized rooms made of the given metal, each of said rooms having fine holes to allow the material gas to pass therethrough, and successively arranged in such a manner that said material gas moves from one room toward the other adjacent thereto.
 
Claims
What is claimed is:

1. A thermal decomposition cell for producing a molecular beam from a material gas by thermal decomposition, comprising:

(a) a crucible heated to and maintained at a temperature sufficient to thermally decompose said material gas effused into said crucible along a first direction; and

(b) a thermal decomposition baffle provided in said crucible and heated to said temperature for producing said molecular beam by thermal-decomposing said material gas such that said material gas is baffled in substantially all directions, said thermal decomposition baffle being made of a metal.

2. A thermal decomposition cell as claimed in claim 1, wherein said thermal decomposition baffle comprises at least one fiber.



Description
BACKGROUND OF THE INVENTION

1. Field of the Invention

This invention relates to a thermal decomposition cell for producing molecular beams of an element from material gas.

2. Description of the Prior Art

A thermal decomposition cell is known. Such cell comprises a cell body, a crucible contained in the cell body, a heater for heating the crucible, a thermal decomposition baffle for producing a molecular beam from a material gas using heat from the crucible, and a gas supply tube for supplying a material gas of an element into the crucible through the bottom of the crucible. The material gas supplied to the crucible is subject to heat decomposition to produce a molecular beam used for epitaxial growth on a substrate placed on the top opening of the crucible. Generally, an epitaxial method using the molecular beam from a gas source is known as a thin-film-forming technique of the semiconductor materials. In this method, a material gas (for example, Arsine, Phosphine, etc.), which contributes crystal growth on the substrate is used. Generally, a thermal decomposition temperature of the material gas may be higher than the substrate growth temperature. In this case, the molecular beam is produced as follows:
 
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