Device for transferring plate-like objects

5562387
Add to folder: View Folders  
Keywords to Highlight:

full-text

print

pdf

permalink

Inventors

Ishii, Katsumi
Kikuchi, Hisashi

Application #

317751

Filed

Oct-4-1994

Published

Oct-8-1996

Current US Class

118/719
414/217
414/416.02
414/662
414/744.2
414/937
414/939
414/941
901/46

International Classes

B65G 001/00; 744.3

Field of Search

414/416 414/417 414/752 414/749 414/217 414/222 414/225 414/226 414/937 414/941 414/662 414/664 414/665 414/744.8 414/668 414/607 414/744.21 118/719 901/46

Assignee

Tokyo Electron Limited (Tokyo, JP); Tokyo Electron Tohoku Limited (Esashi, JP)

Examiners

Werner; Frank E.

Attorney, Agent or Firm

Oblon, Spivak, McClelland, Maier & Neustadt, P.C.

US Patent References

5048164   Vertical heat-treatm...
5055036   Method of loading...
5183370   Apparatus for placi...
5273244   Plate-like member...
5297910   Transportation-tran...
5364222   Apparatus for proc...

Referenced by:

View Backward References

Citation

Cite This Patent

More From Subclass 719

4462332   Magnetic gas gate
6231732   Cylindrical carriag...
4442143   Catalytic curing of...
4274936   Vacuum deposition...
6712907   Magnetically coupl...
5417537   Wafer transport dev...
5011366   Ultraclean robotic...
6093252   Process chamber w...
5199994   Impurity doping ap...
5589224   Apparatus for full...
5656902   Two-axis magnetic...
5569328   Silicon semiconduc...
6090247   Apparatus for coati...
6837936   Semiconductor ma...
4699082   Apparatus for che...
5154810   Thin film coating a...
4182749   Chemical synthesis...
6562128   In-situ post epitaxia...
4461239   Reduced capacita...
5216223   Plasma treatment a...
4624214   Dry-processing app...
6585823   Atomic layer depos...
4632057   CVD plasma reactor
5647912   Plasma processing...
6517691   Substrate processin...
5534069   Method of treating...
4294194   Device for coating...
5016561   Continuous vacuu...
4048955   Continuous chemic...
6875306   Vacuum processin...
4927484   Reactive ion etchin...
6503379   Mobile plating syst...
5882165   Multiple chamber i...
4539933   Chemical vapor de...
6896513   Large area substrat...
5980684   Processing apparat...
5044311   Plasma chemical v...
6808592   High throughput pl...
5474611   Plasma vapor dep...
4276855   Coating apparatus
5025751   Solid film growth a...
6500264   Continuous thermal...
6251192   Vacuum exhaust sy...
6607602   Device for processi...
6949143   Dual substrate load...
4651673   CVD apparatus
5785762   External combustio...
4601260   Vertical semicondu...
4989540   Apparatus for react...
5468111   Disc loading and u...
6360687   Wafer flattening sys...
5065697   Laser sputtering ap...
5571331   Vacuum treatment...
4952299   Wafer handling ap...
5174826   Laser-assisted che...
5413663   Plasma processing...
6382902   Method for controlli...
6447607   Apparatus for grow...
6110540   Plasma apparatus...
5855680   Apparatus for grow...
6051276   Internally heated p...
5404894   Conveyor apparatus
6972055   Continuous flow de...
5423971   Arrangement for co...
4836140   Photo-CVD apparat...
6932871   Multi-station deposit...
4932357   Vacuum apparatus
4599971   Vapor deposition fil...
5556472   Film deposition ap...
6991826   Antisoiling coatings...
 

More From Class 118

5952082   Electrophotographi...
6837936   Semiconductor ma...
5234501   Oxidation metod
5207833   Line travel spray c...
4936252   Equipment for ma...
7011711   Chemical vapor de...
5279671   Thermal vapor dep...
5267607   Substrate processin...
4945856   Parylene depositio...
6440320   Substrate processin...
6761125   Coating film formi...
6148762   Plasma processing...
 
Abstract
A plate-like object carrier device comprising plural arms arranged at a same pitch interval to horizontally support a wafer on each of the arms, a first motor for driving a single arm forward and backward and independently of a group of arms, a second motor for driving the group of arms forward and backward at the same time except the single arm, a power supply for supplying power to the first and second motors, and a controller for selecting whether to supply power only to the first motor or both of the first and second motors.
 
Claims
What is claimed is:

1. A device for collectively transferring a plurality of plate-like objects into and out of a processing apparatus for applying a treatment to said objects in a batch process, comprising:

plural arms including an intermediate single arm and a group of arms positioned to have said single arm interposed therebetween, and arranged at substantially the same vertical pitch to horizontally support the plate-like objects on main surfaces thereof;

first drive means for independently driving said intermediate single arm forward and backward;

second drive means for simultaneously driving said group of arms forward and backward;

sensor means for detecting the state of the plate-like object to be transferred;



Description
BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to a device for transferring plate-like objects such as semiconductor wafers.

2. Description of the Related Art

The semiconductor wafer processing apparatuses have a carrier mechanism or device for transferring or carrying wafers, which will be loaded into and unloaded from a process section, into a housing section such as the cassette. One of these wafer processing apparatuses which use this carrier mechanism is the heat processing apparatus. This heat processing apparatus is intended to oxidize, diffuse and anneal the wafer or film-form on it. Plural sheets of semiconductor wafers are transferred from the cassette into a boat, which will be loaded into a heat processing tube, in the heat processing apparatus, or these semiconductor wafers which have been unloaded from the heat processing tube are transferred from the boat into the cassette in it.

As shown in FIG. 1, the carrier device is arranged in a load/unload section of the heat processing apparatus to transfer semiconductor wafers between the cassette and the boat. It is intended to increase throughput in the course of making semiconductor devices, and it can carry the wafers all at once. The carrier device has an arm mechanism 10 rotatable, movable up and down and reciprocatable. This arm mechanism 10 has a wafer-mounted section, on which five sheets of wafers can be mounted, at the front end of an arm. It can transfer five sheets of wafers all at once between the cassette 12 and the boat 14.
 
  A treatment apparatus comprises a treatment chamber for performing a treatment for a workpiece W, a loading chamber connected to the treatment chamber,...  A method of continuous manufacture of semiconductor integrated circuits, said method and apparatus adapted to contain the semiconductor substrate, semiconductor...