Vacuum exhaust system

6251192
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Inventors

Kawamura, Takeshi
Niimura, Yasuhiro

Application #

252236

Filed

Feb-18-1999

Published

Jun-26-2001

Current US Class

118/719

International Classes

C23C 016/00

Field of Search

118/715 118/719 156/345

Assignee

Ebara Corporation (Tokyo, JP)

Examiners

Mills; Gregory

Attorney, Agent or Firm

Armstrong, Westerman, Hattori, McLeland, & Naughton, LLP

US Patent References

4725204   Vacuum manifold...
5190438   Vacuum pump
5388944   Vertical heat-treatin...
5443644   Gas exhaust system...
5556473   Parylene depositio...
5558717   CVD Processing ch...
5672322   Method, dry multi-s...
5685963   In situ getter pump...
5707451   Method and appar...
5855681   Ultra high through...
5873942   Apparatus and met...
5902088   Single loadlock ch...
5913978   Apparatus and met...
 

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Abstract
A vacuum exhaust system can improve the operating efficiency of the vacuum exhaust system while reducing the system cost, to quickly attain a vacuum in the auxiliary chambers without increasing the size of the vacuum pumps. The vacuum exhaust system comprises a first pumping section and a second pumping section disposed downstream of and in series with the first pumping section. A main exhaust passage is provided to communicate a main chamber with a suction port of the first pumping section, and an auxiliary exhaust passage is provided to communicate an auxiliary chamber with a suction port of the second pumping section.
 
Claims
What is claimed is:

1. A vacuum exhaust system for evacuating a main chamber and at least one associated auxiliary chamber comprising:

a first pumping section;

a second pumping section disposed downstream of and in series with said first pumping section;

a main exhaust passage allowing said main chamber to communicate with a suction port of said first pumping section; and

at least one auxiliary exhaust passage allowing said auxiliary chamber to communicate with a suction port of said second pumping section;

wherein said main chamber comprises a processing chamber and said auxiliary chamber comprises a load lock chamber, and said processing chamber and said load lock chamber are connected to each other through a gate so that a workpiece is loaded to said processing chamber from said load lock chamber and processed in said processing chamber, and including means operative while said workpiece is processed, to simultaneously operate said first pumping section and said second pumping section to evacuate said processing chamber.



Description
BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to a vacuum exhaust system for use in evacuating a processing chamber for advanced products such as semiconductor devices, for example.

2. Description of the Related Art

A conventional arrangement of a vacuum exhaust system used in semiconductor device manufacturing processes to evacuate a processing chamber for carrying out such process as etching and chemical vapor deposition (CVD) of semiconductor wafers is shown in FIG. 8. A main chamber (processing chamber)10 is connected on both sides to auxiliary chambers (load lock chambers) 12a, 12b, for loading and unloading purposes through respective gates 14. Each auxiliary chamber 12a, 12b is isolated from, or open to, the external environment by a gate 15.

The main chamber 10 is connected to a vacuum pump 18 through an exhaust path 16 having a valve 20, and each auxiliary chamber 12a, 12b is connected similarly to a vacuum pump 24 through an exhaust path 22 having a valve 26. It has been customary to use rotary oil pumps for the vacuum pumps 18, 24, but lately, dry pumps are used primarily for this type of work.
 
  One of the disclosed processing apparatus includes a processing vessel having an inner processing space defined by a ceiling portion, a bottom portion,...  A control apparatus comprises a plurality of process units operating in accordance with parameters, a storing section for storing parameters relevant to...