Vacuum treatment apparatus

5571331
Add to folder: View Folders  
Keywords to Highlight:

full-text

print

pdf

permalink

Inventors

Schertler, Roman
Muralt, Paul-Rene

Application #

402618

Filed

Mar-13-1995

Published

Nov-5-1996

Current US Class

118/719
118/729
118/730
204/298.07

International Classes

C23C 016/00

Field of Search

118/719 118/729 118/730 118/728 156/345 204/298.07 204/298.33

Assignee

Balzers Aktiengesellschaft (LI)

Examiners

Breneman; R. Bruce

Attorney, Agent or Firm

Notaro & Michalos

US Patent References

5439547   Semiconductor ma...
5470784   Method of forming...
5474410   Multi-chamber syst...
5474641   Processing method...
5503675   Apparatus for appl...
5505779   Integrated module...
5515986   Plasma treatment a...

Referenced by:

View Backward References

Citation

Cite This Patent

More From Subclass 719

6176929   Thin-film depositio...
6972055   Continuous flow de...
5074245   Diamond synthesizi...
5002010   Vacuum vessel
6585823   Atomic layer depos...
6258169   Control apparatus...
6549825   Alignment apparatus
6712907   Magnetically coupl...
6152070   Tandem process ch...
6736016   Paint booth air dete...
6051276   Internally heated p...
5769588   Dual cassette load l...
 

More From Class 118

5216223   Plasma treatment a...
4547248   Automatic shutoff v...
6863735   Epitaxial growth fu...
5076204   Apparatus for prod...
5342660   Method for plasma...
5554222   Ionization depositio...
6569241   Substrate spinning...
5074776   Paper-coating
4858553   Short-dwell coater
4978412   Plasma processing...
6007634   Vapor deposition a...
5205919   Cathode sputtering...
 
Abstract
Vacuum treatment apparatus including at least two chambers that are linked by a transit opening. A valve body pivotally linked within the opening pivots around a pivot axis that is disposed transversely in the opening. A drive for pivoting the valve body around the pivot axis also provided. The valve body has at least one workpiece carrier to be transported by pivoting the valve body around the pivot axis between the two chambers. An expandable seal arrangement is provided around the opening. The seal arrangement is expandable by pressure of a pressurizing medium, so as to seal the body against the opening in dependency of the pressure of the pressurizing medium.
 
Claims
We claim:

1. Vacuum treatment apparatus, comprising

at least two chambers linked by a transit opening,

a valve body pivotably linked within said opening to pivote around a pivot axis being disposed transverse in said opening,

a drive for pivoting said valve body around said pivot axis,

whereby said valve body comprises at least one workpiece carrier to be transported by pivoting said valve body around said pivote axis between said at least two chambers

an expandable seal arrangement around said opening, at least one of at said body and of at said opening, said seal arrangement being expandable by pressure of a pressurizing medium, so as to seal said body against said opening in dependency of said pressure of said pressurizing medium.



Description
BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention is generally directed to a technique for conveying at least one workpiece at a time from one vacuum chamber into a second vacuum chamber of a vacuum treatment apparatus. Thereby, and as will be described as a preferred example, one of the two chambers may be a load lock chamber, whereby the second of the two chambers is, as a preferred example, too, a treatment chamber wherein workpieces are subjected to a vacuum treatment at one or more than one treatment stations, as e.g. for physical vapour deposition (PVD), plasma enhanced chemical vapour deposition (PECVD) or chemical vapour deposition (CVD) processes, or where the workpieces are heated as e.g. for degasing the workpieces before subjecting them to further treatment.

2. Description of Prior Art

E.g. from the prospectus of the applicant, Balzers AG, "Load Lock Sputtering System LLS 801", BB 800 240 PE (8403), it is known to provide at such vacuum treatment apparatus a workpiece holder cylinder, a so-called substrate basket which is introduced into a load lock chamber with untreated substrates. After introduction of the substrate basket into the load lock chamber, the latter is evacuated. The two chambers are linked via a transit opening. There is provided a sliding valve in the transit opening so as to separate the load lock chamber from the treatment chamber.
 
  The invention relates to a system for manufacturing semiconductor devices from silicon semiconductor wafers, comprising forming device operable forming...  A thin film forming device comprises a vacuum chamber which is vacuous inside, a substrate holder which is provided in the vacuum chamber for holding a...