Vacuum treatment system

6454908
Add to folder: View Folders  
Keywords to Highlight:

full-text

print

pdf

permalink

Inventors

Schertler, Roman
Dubs, Martin

Application #

602522

Filed

Jun-22-2000

Published

Sep-24-2002

Current US Class

118/719
118/730
198/377.01
204/192.12
204/298.15
204/298.23
204/298.25
204/298.27
204/298.28

International Classes

C23C 014/34

Field of Search

204/192.12 204/298.15 204/298.23 204/298.27 204/298.28 204/298.25 118/730 118/719 198/377.01

Assignee

Unaxis Trading AG (Trubbach, CH)

Examiners

McDonald; Rodney G.

Attorney, Agent or Firm

Crowell & Moring LLP

US Patent References

5240583   Apparatus to depos...
5468299   Device comprising...
5569967   Magnetic gear and...
5795448   Magnetic device for...

Referenced by:

View Backward References

Citation

Cite This Patent

More From Subclass 719

5846328   In-line film depositi...
5609688   Apparatus for prod...
5222074   Thermal decompos...
5474611   Plasma vapor dep...
6875306   Vacuum processin...
4048955   Continuous chemic...
6858119   Mobile plating syst...
5562387   Device for transferr...
5076204   Apparatus for prod...
6500264   Continuous thermal...
6110540   Plasma apparatus...
5074245   Diamond synthesizi...
4725204   Vacuum manifold...
5085166   Laser vapor deposit...
4986213   Semiconductor ma...
4182749   Chemical synthesis...
5482557   Device for forming...
5378283   Treating device
6630053   Semiconductor pro...
6607602   Device for processi...
6875282   Substrate transport...
6153013   Deposited-film-form...
5470389   Apparatus for form...
4539933   Chemical vapor de...
6152070   Tandem process ch...
4651673   CVD apparatus
5851296   Vacuum processin...
4761171   Apparatus for coati...
5424097   Continuous vapor d...
5261776   Vacuum operated...
5292393   Multichamber inte...
5133285   Apparatus for trans...
5591268   Plasma process wit...
4806225   Desmearing and pl...
4462332   Magnetic gas gate
5154810   Thin film coating a...
5478609   Substrate heating...
4803947   Apparatus for form...
6562141   Dual degas/cool lo...
5462603   Semiconductor pro...
4966519   Integrated circuit pr...
5769588   Dual cassette load l...
6168667   Resist-processing a...
5122222   Frequency-domain...
5542979   Apparatus for prod...
4932357   Vacuum apparatus
6051276   Internally heated p...
5540777   Aluminum oxide L...
6666922   System for processi...
5588999   Thin film forming...
4733631   Apparatus for coati...
5855679   Semiconductor ma...
6030458   Phosphorus effusio...
6503379   Mobile plating syst...
6068088   Releasable semico...
6627039   Plasma processing...
4359493   Method of vapor de...
4836140   Photo-CVD apparat...
4825808   Substrate processin...
4601260   Vertical semicondu...
4826711   Semiconductor ma...
5302209   Apparatus for man...
5234501   Oxidation metod
5753092   Cylindrical carriag...
4525382   Photochemical vap...
6270581   Wet-oxidation appa...
4984954   Spatula for wafer tr...
 

More From Class 118

4920920   Apparatus for prod...
4495888   Coating mechanism
5560624   Disk clamping coll...
4978412   Plasma processing...
4347431   Diffusion furnace
5458925   Dual geometry for s...
4182749   Chemical synthesis...
4935623   Production of ener...
5439519   Solution applying...
4589667   Vacuum compatibl...
4597823   Rapid LPE crystal...
4683836   Airbrush guidance...
 
Abstract
A vacuum treatment system has a vacuum chamber in which there is at least one part which is driven in rotation and is connected by a gear train which comprises at least two rotating transmission bodies with a motor drive unit. The rotating transmission bodies produce a relative motion in a rolling manner. For this purpose, the bodies have axes of rotation that are not aligned. The rotating transmission bodies are magnetically drive-coupled to each other, and at least one of them is located in the vacuum chamber.
 
Claims
What is claimed is:

1. A vacuum treatment system, comprising a vacuum chamber, at least one planetary transmission system within said vacuum chamber, said at least one planetary transmission system comprising planet wheels conceived as carriers for disk-shaped workpieces and rotatably mounted on a sun wheel of said at least one planetary transmission system; a motor drive outside said chamber operatively coupled to said sun wheel, said planet wheels having an arrangement of magnets coaxially to an axis of said planet wheels, the magnets of said arrangement of said planet wheel being magnetically coupled to a collar of magnets stationarily mounted with respect to said sun wheel and to said planet wheels and coaxially to said axis of said sun wheel.



Description
BACKGROUND OF THE INVENTION

This application claims priority of prior foreign applications 1997 2940/97 and 1998/1065/98, filed on Dec. 22, 1997 and May 13, 1998, respectively, the disclosure of which is expressly incorporated by reference here.

The present invention relates to a vacuum treatment system having a vacuum chamber, and at least one rotatably driven part lo within that chamber, which rotatably driven part is connected by way of a transmission comprising at least two mutually rolling-off rotational transmission bodies with a motor-type drive unit.

The present invention is addressed to problems which occur during vacuum coating, particularly of optical disks, particularly of rewrite disks. However, the findings made here can also easily be applied to other vacuum treatments; in principle, wherever a part must be rotatably driven in a vacuum treatment chamber of a system.

It is known to provide substrate carriers on planet wheels of a planetary transmission, for example, for sputtering systems, in order to implement, by way of a sputtering source, while utilizing maximal fractions of sputtered-off material on the substrates, a distribution of the applied layer thickness which is as homogeneous as possible. For the rotary drive, normally gear-type transmissions are used in the vacuum atmosphere.
 
  A workpiece loading interface is included within a workpiece processing system which processes workpieces, typically wafers, in a vacuum. The workpiece...  In an atmosphere of processing gas, on a wafer W consisting mainly of silicon, through a planar-array antenna RLSA 60 having a plurality of slits, microwaves...