Method of vapor deposition

4182783
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Inventors

Henery, Vern A.

Application #

836177

Filed

Sep-23-1977

Published

Jan-8-1980

Current US Class

118/719
118/DIG5
427/255.25

International Classes

C23C 011/00; C23C 013/12

Field of Search

118/48-49.1 118/DIG. 427/50-52 427/69 427/70 427/78 427/91 427/99 427/109 427/124 427/166 427/167 427/248-255

Assignee

PPG Industries, Inc. (Pittsburgh, PA)

Examiners

Kaplan; Morris

Attorney, Agent or Firm

Seidel; Donna L., Pollock; E. Kears

US Patent References

3970037   Coating compositio...

Referenced by:

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Citation

Cite This Patent

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Abstract
An apparatus and method are provided for fluidizing and vaporizing particulate solid coating reactants by first establishing a fluidized bed of dispersed particulant solid coating reactants and thereafter drawing a volume of fluidizing gas and suspended particulate solid coating reactant to a vaporizer while mixing an additional volume of gas therewith and then vaporizing the dispersed particulate solid coating reactant in the reactant-gas mixture. The reactant-gas mixture is then directed into contact with a hot substrate to be coated in order to deposit a film thereon.
 
Claims
I claim:

1. In a method of coating a substrate with a film by deposition from a reactant composition wherein the reactant composition is caused to react at a surface of the substrate by maintaining the substrate at a temperature sufficient to cause pyrolysis of the reactant composition upon its contact therewith, the improvement which comprises

fluidizing a mass of particulate solid coating reactant with a gas at a temperature substantially below the reaction temperature, decomposition temperature or vaporization temperature of the reactant;

drawing a volume of fluidizing gas and suspended particulate solid reactant from the fluidized mass as a particulate reactant-gas composition;



Description
BACKGROUND OF THE INVENTION

This invention relates to coating substrates, particularly glass substrates, by chemical vapor deposition. This invention more particularly relates to a method for preparing gas-reactant vapor mixtures for use in such chemical vapor deposition methods.

Chemical deposition processes such as pyrolytic processes and hydrolytic processes are well known in the art of coating substrates. The physical form of the coating reactants employed in such processes may be liquid, vapor, liquids or solids dispersed in gas mixtures or vaporized or vaporous coating reactants dispersed in gas mixtures. The use of vaporized or vaporous coating reactants is characterized as a chemical vapor deposition process. U.S. Pat. No. 3,852,098 to Bloss et al teaches the vaporization of dispersed solid coating reactants to provide a reactant vapor suitable for reaction to deposit films on substrates, such as glass.

U.S. Pat. No. 3,970,037 to Sopko discloses a coating composition vaporizer which may be employed to vaporize a vaporizable coating reactant for subsequent delivery through a nozzle or otherwise into contact with a substrate to be coated by a chemical vapor deposition technique. Solid reactants for use in the deposition of films by chemical vapor techniques have been vaporized in a variety of ways. Typically, a fixed bed of particulate solid coating reactant is maintained in a vaporization chamber such as shown in U.S. Pat. No. 2,780,553 to Pawlyk. A hot carrier gas is passed through the fixed bed of coating reactant to vaporize the reactant and to carry the vaporized reactant from the chamber in which the fixed bed of reactant resides to a substrate upon which a film is to be deposited. One of the problems associated with the use of a typical fixed bed coating reactant vaporizer is caused by the tendency for many pyrolytic coating reactants in particular to fuse into a sticky mass when heated so that the vaporizer becomes clogged with liquid coating reactant before the coating reactant can be effectively vaporized. Another problem associated with the use of fixed bed vaporizers has been preignition or the premature combustion or reaction of pyrolytic coating reactants when hot air is employed as a carrier gas.
 
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