Stand for polishing artificial fingernails

4696316
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Inventors

Stanley, Sandra M.

Application #

817593

Filed

Jan-10-1986

Published

Sep-29-1987

Current US Class

132/73

International Classes

A45D 029/00

Field of Search

128/73 128/88.5 128/73.5 206/581 206/823 248/127 D28/61

Examiners

Peshock; Robert

Attorney, Agent or Firm

Charmasson & Holz

US Patent References

3972325   Fingernail protector...
3982551   False fingernail kit
4106614   Artificial fingernail...
4140139   Mounting and pac...
4575037   Stand to hold a boo...

Referenced by:

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Citation

Cite This Patent

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Abstract
A stand for retaining and polishing artificial fingernails, comprising an L-shaped leg, a plate, a base having a convex head and a device for releasably attaching the fingernails to the head.
 
Claims
What is claimed is:

1. A stand for retaining and polishing artificial fingernails, with comprises:

a plate having an upper surface and a bottom surface;

means for supporting the plate, wherein said means for supporting is secured to the bottom surface;

at least one base for supporting fingernails secured to the upper surface;

a releasable means for adhering the fingernails to the base;

wherein the base comprises at least one ridge having a convex head, said head being shaped and dimensioned to receive, retain and provide elevation to the fingernails.

2. The stand of claim 1, wherein the means for adhering comprises a double-sided adhesive tape, one side being attached to the convex head, and the other side retaining the fingernail.



Description
FIELD OF THE INVENTION

This invention generally relates to manicuring or pedicuring and more particularly to an improved reusable device for retaining and polishing artificial fingernails.

BACKGROUND OF THE INVENTION

The most common way to polish artificial fingernails, is to attach them to the wearers fingers before applying any polish or finish. This method is problematic because the wearer has to wait for the polish to dry before regaining the active use of the fingers. Moreover, the spillover and cleanup are bothersome and time consuming.

Less common polishing methods have been disclosed by the prior art. The Sazdanoff U.S. Pat. No. 4,524,789 is a representative of such methods. The Sazdanoff patent discloses a finger rest for stabilizing a finger during manicuring. This device, while it may partially overcome the spill over problem, does not permit the user to restore the active use of the fingers prior to drying the polish.

A close reference of the prior art is the Robichaud U.S. Pat. No. 4,287,899, which describes a nail form device having a forward portion and a rearward portion. The forward portion comprises an awkwardly convex surface for supporting the synthetic nail. The rearward portion has a downwardly concave surface for supporting the finger to which the synthetic nail is to be attached. While this nail form provides a support for polishing artificial fingernails, it has at least two disadvantages. The first is that it could only accomodate one finger at a time. The second is that it is complex and relatively costly to manufacture.
 
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