Valve with an integral orifice

6871803
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Inventors

Ohmi, Tadahiro
Nishino, Kouji
Ikeda, Nobukazu
Yamaji, Michio
Dohi, Ryousuke
Ideta, Eiji
Hirose, Takashi

Application #

048597

Filed

Feb-1-2002

Published

Mar-29-2005

Current US Class

239/533.3
239/585.1
239/585.5
239/596
239/88

International Classes

B05B 001//00; B05B 001//30; F02M 047//02

Field of Search

239/596 239/88-92 239/95 239/600 239/585.1-585.5 239/533.2 239/533.3 239/533.14 251/129.15 251/129.21 251/127

Assignee

Fujikin Incorporated (Osaka, JP); Ohmi; Tadahiro (Sendai, JP)

Examiners

Hwu; Davis

Attorney, Agent or Firm

Griffin & Szipl, P.C.

US Patent References

4073311   Flow control valve
4643359   Mini injector valve
5301712   Slide valve
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6027037   Accumulator fuel i...
6357677   Fuel injection valve...

Referenced by:

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Citation

Cite This Patent

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Abstract
A valve with an integral orifice for use in gas feeding equipment provided with a pressure-type flow volume control device to be employed for manufacturing of semi-conductors and chemical goods. The valve with an integral orifice has the excellent flow rate control characteristics by improving the processing accuracy of the orifice and preventing the distortion of the orifice at the time of assembling. The orifice is formed in a stainless steel made orifice disc. The metal-made orifice disc with the orifice formed by separate processing and the synthetic-resin-made valve seat body are removably assembled, wherein the orifice disc and the synthetic resin made valve seat body are fixed airtight to the valve main body by pressing the valve seat body via a metal inner disc.
 
Claims
What is claimed is:

1. A valve with an integral orifice which comprises a valve main body made of heat-resisting materials in which a gas inflow passage and a gas outflow passage in communication with a valve chamber with an open upper end are formed, a valve seat body made of synthetic resin which is fitted in the valve chamber of the valve main body and provided with a gas outflow passage in communication with the gas outflow passage of the aforementioned valve main body and a valve seat, an orifice disc made of heat-resisting materials removably fitted in the gas outflow passage of the valve seat body, and an orifice which is formed in the orifice disc and reduces the outflow passage of the valve seat body, wherein the orifice disc is formed in the shape of a plug and is screwed in the gas outflow passage of the valve sent body, and wherein an inner disc made of heat-resisting materials and provided with a gas inflow passage and a aperture for receiving the valve seat body is inserted into a valve chamber of the valve main body and the valve seat body fitted in the aperture for receiving the valve seat body is fixed airtight to the valve main body by pressing the outer circumferential portions of the inner disc from above.



Description
FIELD OF THE INVENTION

The present invention relates to a valve with an integral orifice for use in gas feeding equipment and the like that is provided with a pressure-type flow rate control device for semi-conductor manufacturing devices, chemical goods manufacturing equipment and the like.

BACKGROUND OF THE INVENTION

Gas feeding equipment having a pressure-type flow rate control device for use in semi-conductor manufacturing devices and chemical goods manufacturing equipment is disclosed in WO 99/63412 A filed earlier by the present applicants. As shown in FIG. 9, the gas feeding equipment is designed to feed gas to a process 52 through an orifice corresponding valve 51, whilst controlling the gas flow rate such that a pressure P.sub.1 upstream of an orifice 50 of more than twice the pressure P.sub.2 downstream of the orifice 50 is maintained. Particularly, the pressure-type flow rate control device 100 comprises a control valve 53 which receives gas from a gas feeding source, said orifice corresponding valve 51 installed on the downstream side of the control valve 53, a pressure detector 54 installed between the aforementioned control valve 53 and the orifice corresponding valve 51, the orifice 50 installed at the downstream side of a valve mechanism part of the orifice corresponding valve 51, and a computer control device 55 which calculates the flow rate by Qc=KP.sub.1 (K=a constant) from the pressure P.sub.1 detected by the aforementioned pressure detector 54, and, at the same time, outputs as a control signal Qy the difference between a flow rate command signal Qs and a computed flow volume Qc to a driving part 53a of the control valve 53, thus controlling the flow rate of the gas to be fed to the process 52 by controlling the opening/closing mechanism of the control valve for adjusting the pressure P.sub.1.
 
  A valve arrangement is disclosed which comprises a valve member engageable with a seating. The valve member includes a relatively flexible region whereby...