Nail polish remover

5077038
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Inventors

Hofmann, William H.

Application #

555786

Filed

Jul-19-1990

Published

Dec-31-1991

Current US Class

134/38
252/364
424/61
510/118
510/405
510/433
510/488

International Classes

A61K 007/047

Field of Search

424/61 134/38 252/364 252/546

Assignee

Vi-Jon Laboratories, Inc. (St. Louis, MO)

Examiners

Page; Thurman K.

Attorney, Agent or Firm

Armstrong, Teasdale, Schlafly & Davis

US Patent References

4485037   Nail polish remover
4735798   Nailpolish remover...
4824662   Nail polish remover

Referenced by:

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Citation

Cite This Patent

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Abstract
A nail polish remover base comprising less than 79% acetone or less than 81% ethyl acetate combined with water or a mixture of a water and ethanol to produce a 100% by weight of the base. The base can be combined with vegetable or animal protein, perfumes, surfactants and coloring agents to produce a final nail polish remover.
 
Claims
What is claimed is:

1. A nail polish remover having low total solvent concentrations consisting essentially of a polish remover base having an active ingredient selected from the group consisting of acetone and ethyl acetate in which acetone is present in an amount between 60% and less than 79% by weight and water is present form 21 to 40% by weight or ethyl acetate is present in an amount between about 60% to less than 81% by weight and water is present in an amount between 19-35% by weight; and the remainder of the base is selected from the group consisting of ethanol, isopropanol, nd mixtures thereof; the nail polish remover having from about 0.05 to about 0.25% by weight of a cosmetically acceptable salt of a hydrolyzed soy protein having a molecular weight of between about 1000-4000, and from about 0.1 to 0.3% by weight of a cocamidopropyl dimethylamine propionate, the combination being effective to substantially completely remove nail polish without drying of the nail and surrounding skin.



Description
BACKGROUND OF THE INVENTION

The present invention relates to a novel composition for removing nail lacquer and in particular the present invention relates to a novel base utilizing more water and less solvent than is conventionally used in leading nail polish remover compositions.

Many compositions are known which are useful in removing lacquer from fingernails or toenails. These compositions depend primarily upon the solvent action of acetone or an acetone-like solvent to soften or dissolve the nail lacquer. After the lacquer has been dissolved or softened, it is usually removed by a gentle abrasive or by a gentle rubbing action.

In addition to acetone, ethyl acetate is a well known solvent used in nail polish removers.

These solvents readily remove the nail lacquer. However, when used alone they have a dehydrating effect on the nails of the user, rendering the nail dry, hard and susceptible to cracking and breaking.

Usually the solvents used in commercial nail polish removers all contain other materials, such as water and/or various oils, which not only lower the dehydrating effect of the solvents, but also are believed to lower the enamel dissolving efficiency of the solvents.
 
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