Ultrasonic glow discharge surface cleaning

5068002
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Inventors

Monroe, Marvin E.

Application #

389308

Filed

Aug-3-1989

Published

Nov-26-1991

Current US Class

134/1
156/345.28
156/345.47
204/192.1
204/298.31
216/61
216/67

International Classes

B44C 001/22; B08B 003/12

Field of Search

134/1 156/345 156/643 156/646 156/626 156/627 204/164 204/298.1 204/298.31 204/298.32 204/298.34 204/298.39 204/192.1 204/192.32 204/192.33

Assignee

Quintron, Inc. (Galena, OH)

Examiners

Powell; William A.

Attorney, Agent or Firm

Foster; Frank H.

US Patent References

4657616   In-situ CVD chamb...
4786352   Apparatus for in-sit...

Referenced by:

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Citation

Cite This Patent

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Abstract
An apparatus is disclosed for abrading contaminants from the surface of a workpiece using plasma glow discharge. The workpieces are positioned in a low pressure chamber with an ionizable gas. A pair of spaced, conductive, interfacing panels form electrodes mounted within the chamber and defining a three-dimensional cleaning space between the electrodes. The electrodes are energized by a power supply, providing an alternative voltage at an ultrasonic frequency and the pressure is maintained to allow only abnormal glow discharge. After initiation of the abnormal glow discharge the electrode current is sensed to detect when to inject additional ionizable gas into the low pressure chamber.
 
Claims
I claim:

1. An apparatus for abrading contaminants from the surface of a workpiece and comprising:

(a) a low pressure chamber having a sealable closure;

(b) pumping means connected to the chamber for removing gas;

(c) a source of ionizable gas connected to the chamber;

(d) a set of spaced conductors forming electrodes mounted within the chamber and having a length and width extent to define a three-dimensional cleaning space in the volume defined between them;

(e) a power supply having its output connected to the electrodes for supplying alternating current to the electrodes at an ultrasonic frequency and at a sufficient voltage and current to ionize gas within the chamber to form a plasma; and



Description
TECHNICAL FIELD

This invention relates generally to the use of ion bombardment from a plasma for cleaning the surfaces of a workpiece, such as a dental implant and more particularly relates to a device of that type which operates at ultrasonic frequencies and has a pair of electrodes within the low pressure chamber to define the cleaning space.

BACKGROUND ART

The bombardment of workpieces with molecular, atomic or subatomic particles has been used for abrading the surfaces of workpieces, for oxidizing surface contaminants or for sterilizing the surface by killing organisms. In such a system an ionizable gas is subjected to an electric or electromagnetic field to free and accelerate electrons. Free electrons gain energy from the imposed electric field and impart this energy through collision with electrically neutral gas molecules to ionize the gas molecules when they collide with them. The collisions produce an ion and further electrons which are then accelerated in opposite directions by the field. A workpiece positioned in the plasma, generated in this manner, is bombarded by these particles. Particles, for example may include oxygen ions, thereby enhancing the probability of oxidation of surface contaminants. Also, other gases, such as aldehydes, have been used for sterilization. Others have used argon or nitrogen to effect a surface abrasion.
 
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