Abrasive material

6824578
Add to folder: View Folders  
Keywords to Highlight:

full-text

print

pdf

permalink

Inventors

Uchino, Yoshitsugu
Yamasaki, Hidehiko
Kuwabara, Shigeru

Application #

363678

Filed

Mar-6-2003

Published

Nov-30-2004

Current US Class

051/298
051/303
051/307
051/309
106/3
106/5

International Classes

C09K 003/14; C09G 001/02; C09G 001/04

Field of Search

51/307 51/308 51/309 51/298 51/303 106/3 106/5

Assignee

Mitsui Mining & Smelting Co., Ltd. (Tokyo, JP)

Examiners

Marcheschi; Michael

Attorney, Agent or Firm

Rothwell, Figg, Ernst & Manbeck, P.C.

Referenced by:

View Backward References

Citation

Cite This Patent

More From Subclass 3

6881757   Aerosol biliquid fo...
5861054   Polishing slurry
6585786   Slurry for chemical...
6346144   Chemical-mechani...
5603739   Abrasive suspensio...
4687591   Cleaning compositi...
5114437   Polishing compositi...
5997620   Polishing compositi...
6652632   Furniture polish co...
6193790   Polishing compositi...
6027554   Polishing compositi...
6638328   Bimodal slurry syst...
 

More From Class 106

6080811   Adhesives for denta...
6106599   Inks
6248806   Antifouling paint
6255432   Hot melt ink jet veh...
4308062   Dental cavity varni...
5304244   Zwitterionic pigments
6475497   Tartar control dentu...
5595675   Fiber treatment co...
6315867   Dispersing agents...
5264027   Detergent resistant...
6764538   Coating for water b...
5798117   Method of reducing...
 
Abstract
A polishing material is provided in which the dispersibility of the abrasive grains of the polishing material having, as a major component, rare earth oxides including cerium oxide is made better and the hardness of abrasive grain precipitates is reduced, and at the same time high efficiency of polishing can be achieved stably. According to the present invention, in a polishing material having, as the major component, rare earth oxides including cerium oxide, any one of crystalline cellulose, calcium secondary phosphate, a condensate of sodium .beta.-naphthalenesulphonate and formalin, and synthetic silica is contained as an anti-solidification agent capable of softening abrasive grain precipitates of the polishing material when the abrasive grains of the polishing material are dispersed into a dispersion medium, and sodium hexametaphosphate or pyrophosphate is contained as a dispersant capable of dispersing the abrasive grains of the polishing material into the dispersion medium.
 
Claims
What is claimed is:

1. A polishing material comprising, as a major component, abrasive grains of cerium oxide and at least one other rare earth oxide, an anti-solidification agent selected from the group consisting of crystalline cellulose, calcium secondary phosphate, and synthetic silica, and a dispersant selected from the group consisting of sodium hexametaphosphate or sodium pyrophosphate, wherein the dispersant is present in an amount effective to disperse the abrasive grains contained in the polishing material into a water-based dispersion medium, and the anti-solidification agent is present in an amount effective to soften the abrasive grains of the polishing material when said abrasive grains are dispersed into said dispersion medium.



Description
CROSS REFERENCE TO RELATED APPLICATION

The present application is a national stage filing under 35 U.S.C. .sctn.371 of PCT/JP01/08671 filed on Oct. 2, 2001, and designating the U.S.

TECHNICAL FIELD

The present invention relates to a polishing material, and particularly to additives contained in constituting a polishing material having, as a major component, rare earth oxides including cerium oxide, composing such a polishing material.

BACKGROUND ART

Recently, glass materials are widely utilized, and used in numerous areas such as not only optical lens applications, but also optical and magnetic disc applications, color filters for liquid crystals, LSI photomasks, and others. Glass; materials for these applications require the smoothness of the surface with strictly high accuracy, and therefore polishing materials having, as the major component, rare earth oxides including cerium oxide have been conventionally employed for processing their surface.
 
  A polishing composition comprising an abrasive, an oxidizing agent, a polishing accelerator, and water, wherein the polishing accelerator comprises an...  There is provided a polishing composition that reduces erosion and is used in a final polishing step of a semiconductor device manufacturing process. The...