Forgery/alteration protective material

6846547
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Inventors

Wada, Masayoshi
Kimura, Asa

Application #

332279

Filed

Jan-7-2003

Published

Jan-25-2005

Current US Class

283/72
428/195
428/323
428/404
428/405
428/406
428/407
428/699
428/701
428/702

International Classes

B32B 009/00; B42D 015/10

Field of Search

428/195 428/323 428/402 428/402.24 428/403 428/913 283/72 283/94

Assignee

Shiseido Co., Ltd. (Tokyo, JP)

Examiners

Stein; Stephen

Attorney, Agent or Firm

Chao; Fei-Fei Bingham McCutchen LLP

US Patent References

5169707   Retroreflective secu...
6000804   Colored light retror...
6060157   Transparent decor...
6166856   Self light-emitting r...
6200666   Thermal transfer c...

Referenced by:

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Citation

Cite This Patent

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Abstract
The purpose of the invention is to provide a forgery/alteration protective material which containing a retroreflecting material and having an improved forgery/alteration protecting effect against the process of the upper part of the material. In order to achieve the above purpose, the forgery/alteration protective material 2 according to the invention where a retroreflecting material 4 for returning the incident light substantially along the path along which the incident light travels is provided and a transparent film 6 is layered on the retroreflecting material 4 is characterized in that a low transmittance layer 8 formed of a material having a lowerer light transmittance than that of the transparent film 6 is provided between the retroreflecting material 4 and the transparent film layer 6, and the light transmittance of the low transmittance layer 8 is 45% or higher to the light in the wavelength range of 420 nm to 700 nm.
 
Claims
What is claimed is:

1. A forgery/alteration protective material comprising

a retroreflecting material for returning an incident light substantially along a path along which the incident light travels,

a transparent film that is layered on said retroreflecting material, and

a low transmittance layer between said retroreflecting material and said transparent film,

wherein said low transmittance layer is formed of a material having a lower light transmittance than that of said transparent film, and the light transmittance of said low transmittance layer is 45% or higher to a light in a wavelength range of 420 nm to 700 nm.

2. The forgery/alteration protective material as claimed in claim 1, wherein information such as letters and/or designed patterns by printing and/or a photograph is recorded between said retroreflecting material and said low transmittance layer or in said retroreflecting material.



Description
RELATED APPLICATIONS

This application claims priority to the Japanese Patent Application 2000-208872 dated on Jul. 10, 2000 and is hereby incorporated with reference for all purposes.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The invention relates to a forgery/alteration protective material, particularly to improvement of a forgery/alteration protective material made information-readable under specified situations using a material with a low light transmittance.

2. Prior Art

A product produced by a specified enterprise is highly evaluated and is regarded as reliable by consumers if a brand name is attached thereto. Such a brand name stimulates the brand preference of consumers and even produces new added values.

However, taking advantage of the reliance and the preference of consumers, there exist some people who try to gain profit by falsely applying the brand name popular among consumers to the products. Forged products sold in markets by such people are often significantly inferior in the quality and accordingly ruin the reliability obtained with much effort among consumers and that is a serious problem for the enterprise.